Semiconductor device

ABSTRACT

A semiconductor device according to an embodiment comprises a first transistor capable of supplying or interrupting power to a load. A clamper comprises a first clamping part and a second clamping part connected in series between one end of the first transistor and a gate of the first transistor and becomes a conduction state when a voltage of the one end of the first transistor exceeds a predetermined voltage. A clamp operation detector is provided between the first clamping part and the second clamping part. A second transistor is connected in parallel with the second clamping part. A delay circuit is provided between the clamp operation detector and a gate of the second transistor.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is based upon and claims the benefit of priority fromthe prior Japanese Patent Application No. 2015-046179, filed on Mar. 9,2015, the entire contents of which are incorporated herein by reference.

FIELD

The embodiments of the present invention relate to a semiconductordevice.

BACKGROUND

A clamp circuit is conventionally provided to protect a switch frominduced electromotive force produced by a load (an inductor). In recentyears, a MOSFET (Metal Oxide Semiconductor Field Effect Transistor) usedas a switch is more and more downscaled and a secondary breakdownvoltage is lowered correspondingly. This reduces a value of a currentthat can flow in the MOSFET in an area in which a voltage between thesource and the drain of the MOSFET is high. That is, the safe operationarea of the MOSFET is narrowed. In this case, the MOSFET has a high riskof being broken by the induced electromotive force from the load.

Accordingly, it is conceivable to lower the breakdown voltage (a clampvoltage) of the clamp circuit. However, an active clamp voltage lowerthan a voltage such as a load dump surge voltage that may be appliedduring an output-off time cannot be set.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a circuit diagram showing an example of a configuration of asemiconductor device 1 according to an embodiment;

FIG. 2 shows an example of an internal configuration of the clampoperation detector DT;

FIGS. 3A and 3B show examples of an internal configuration of the delaycircuit DL, respectively;

FIG. 4 is a timing chart showing an example of the operation of thesemiconductor device 1 according to the present embodiment; and

FIG. 5 is a graph showing a safe operation area of the first transistorTr1 according to the present embodiment.

DETAILED DESCRIPTION

Embodiments will now be explained with reference to the accompanyingdrawings. The present invention is not limited to the embodiments.

A semiconductor device according to an embodiment comprises a firsttransistor capable of supplying or interrupting power to a load. Aclamper comprises a first clamping part and a second clamping partconnected in series between one end of the first transistor and a gateof the first transistor and becomes a conduction state when a voltage ofthe one end of the first transistor exceeds a predetermined voltage. Aclamp operation detector is provided between the first clamping part andthe second clamping part. A second transistor is connected in parallelwith the second clamping part. A delay circuit is provided between theclamp operation detector and a gate of the second transistor.

FIG. 1 is a circuit diagram showing an example of a configuration of asemiconductor device 1 according to an embodiment. The semiconductordevice 1 includes a first transistor Tr1, a second transistor Tr2, aclamper CL, a clamp operation detector DT, a delay circuit DL, andresistors R3 and R2. The semiconductor device 1 can be formed as asingle semiconductor chip or can be formed as a single semiconductorpackage including a plurality of semiconductor chips.

The first transistor Tr1 is a MOSFET connected between a load (aninductor) L and a low-level voltage source VSS. The first transistor Tr1is, for example, an N-transistor. The first transistor Tr1 and the loadL are connected in series between a high-level voltage source VDD andthe low-level voltage source VSS. A drain as an end of the firsttransistor Tr1 is connected to the load L. A source of the firsttransistor Tr1 is connected to the low-level voltage source VSS. A gateof the first transistor Tr1 is connected to a controller CNT via theresistor R3. Accordingly, the first transistor Tr1 becomes an on-stateor an off-state under control of the controller CNT. When the firsttransistor Tr1 becomes an on-state, the load L is connected to thevoltage source VSS and thus a current IL from the voltage source VDD canflow to the voltage source VSS via the load L and the first transistorTr1. When the first transistor Tr1 becomes an off-state, the load L isdisconnected from the voltage source VSS and thus the current IL fromthe voltage source VDD does not flow through the load L. In this way,the first transistor Tr1 functions as a switch that causes the currentIL to flow to the load L or stops the current IL flowing in the load L.

The clamper CL includes a first clamping part CL1 and a second clampingpart CL2. The first clamping part CL1 and the second clamping part CL2are connected in series between the drain of the first transistor Tr1and the gate thereof.

The first clamping part CL1 is connected between the drain of the firsttransistor Tr1 and a node N1 and includes two Zener diodes ZD1_1 andZD1_2. The two Zener diodes ZD1_1 and ZD1_2 are connected in seriesbetween the drain of the first transistor Tr1 and the node N1. A cathodeof the Zener diode ZD1_1 is connected to the drain of the firsttransistor Tr1. An anode of the Zener diode ZD1_1 is connected to acathode of the Zener diode ZD1_2. An anode of the Zener diode ZD1_2 isconnected to the node N1. The node N1 is a connection point between thefirst clamping part CL1 and the second clamping part CL2.

The second clamping part CL2 is connected between a node N2 and the gateof the first transistor Tr1 and includes two Zener diodes ZD2_1 andZD2_2. The two Zener diodes ZD2_1 and ZD2_2 are connected in seriesbetween the node N2 and the gate of the first transistor Tr1. A cathodeof the Zener diode ZD2_1 is connected to the node N2. An anode of theZener diode ZD2_1 is connected to a cathode of the Zener diode ZD2_2. Ananode of the Zener diode ZD2_2 is connected to the gate of the firsttransistor Tr1. In this way, the Zener diodes ZD1_1 to ZD2_2 areconnected in such a manner that a direction from the gate of the firsttransistor Tr1 toward the drain thereof is the forward direction. Thatis, the Zener diodes ZD1_1 to ZD2_2 included in the first and secondclampers CL1 and CL2 are connected between the gate and the drain of thefirst transistor Tr1 in such a manner that a current direction from thedrain to the gate is a reverse direction. With this configuration, whena drain voltage of the first transistor Tr1 exceeds a predeterminedvoltage (the sum of breakdown voltages of the Zener diodes ZD1_1 toZD2_2), the clamper CL causes avalanche breakdown and becomes aconduction state. When the clamper CL becomes a conduction state, theclamper CL clamps the drain voltage to the predetermined voltage.

While being constituted of the plural Zener diodes connected in seriesas described above, each of the first clamping part CL1 and the secondclamping part CL2 can be constituted of a single Zener diode. The numberof Zener diodes constituting each of the first clamping part CL1 and thesecond clamping part CL2 can be three or more.

The second transistor Tr2 is connected in parallel with the secondclamping part CL2 between the node N2 and the gate of the firsttransistor Tr1. The second transistor Tr2 is, for example, anN-transistor. A gate of the second transistor Tr2 is connected to thedelay circuit DL. The second transistor Tr2 becomes an on-state or anoff-state according to a signal from the delay circuit DL. When thesecond transistor Tr2 is in an off-state, the second clamping part CL2is in a state being effectively connected between the node N2 and thegate of the first transistor Tr1. That is, the first and second clampersCL1 and CL2 both function effectively. At this time, a clamp voltage ofthe clamper CL is the sum of the breakdown voltages of the four Zenerdiodes ZD1_1 to ZD2_2. On the other hand, when the second transistor Tr2is in an on-state, the second transistor Tr2 short-circuits between thenode N2 and the gate of the first transistor Tr1. Therefore, the secondclamping part CL2 becomes a disabled state. That is, in this case, whilethe first clamping part CL1 functions effectively, the second clampingpart CL2 is in a state not functioning effectively as a clamp circuit.At this time, a clamp voltage of the clamper CL is the sum of thebreakdown voltages of the two Zener diodes ZD1_1 and ZD1_2. In this way,the semiconductor device 1 can enable or disable the clamp function ofthe second clamping part CL2, thereby changing the clamp voltage of theclamper CL.

The clamp operation detector DT is connected between the node N1 and thenode N2. That is, the clamp operation detector DT is connected betweenthe first clamping part CL1 and the second clamping part CL2. The clampoperation detector DT is a circuit that detects a current flowing in thenodes N1 and N2 when the Zener diodes ZD1_1 to ZD2_2 of the clamper CLcause avalanche breakdown. That is, the clamp operation detector DTdetects the clamp operation of the clamper CL. Upon detection of theclamp operation of the clamper CL, the clamp operation detector DTstarts an operation of the delay circuit DL.

FIG. 2 shows an example of an internal configuration of the clampoperation detector DT. The clamp operation detector DT includes a firstresistive element R1, a differential amplifier DIFF, and an operationalamplifier AMP.

The first resistive element R1 is connected between the nodes N1 and N2.That is, the first resistive element R1 is connected between the firstclamping part CL1 and the second clamping part CL2. When a current flowsin the nodes N1 and N2, a voltage difference occurs between both ends ofthe first resistive element R1. The clamp operation detector DT detectsthe start of the clamp operation by detecting the voltage differencebetween the both ends of the first resistive element R1.

The differential amplifier DIFF serving as a differential part isconnected to the nodes N1 and N2 and amplifies the voltage differencebetween the both ends of the first resistive element R1 to apredetermined voltage to output the predetermined voltage.

The operational amplifier AMP serving as a comparator is connected to anoutput of the differential amplifier DIFF and a power source PS thatgenerates a reference voltage Vref and outputs a detection signal to thedelay circuit DL when an output voltage from the differential amplifierDIFF exceeds the reference voltage Vref.

An output of the operational amplifier AMP is connected to the delaycircuit DL. Accordingly, when the voltage difference between the bothends (N1 and N2) of the first resistive element R1 increases and theoutput voltage from the differential amplifier DIFF exceeds thereference voltage Vref, the operational amplifier AMP outputs thedetection signal (the high-level voltage VDD, for example) to the delaycircuit DL. The delay circuit DL shown in FIG. 1 brings the secondtransistor Tr2 into an on-state after a predetermined time has passedfrom reception of the detection signal from the clamp operation detectorDT.

The delay circuit DL is connected between the clamp operation detectorDT and the gate of the second transistor Tr2. Upon reception of thedetection signal of the clamp operation of the first clamping part CL1from the clamp operation detector DT, the delay circuit DL brings thesecond transistor Tr2 into an on-state after elapse of the predeterminedtime.

FIGS. 3A and 3B show examples of an internal configuration of the delaycircuit DL, respectively. The delay circuit DL can be, for example, anRC delay circuit including a resistor and a capacitor as shown in FIG.3A. Alternatively, the delay circuit DL can be a counter or a shiftregister that counts a clock signal CLK generated outside or inside thesemiconductor device 1 as shown in FIG. 3B. FF in FIG. 3B denotes aflip-flop.

In this way, the semiconductor device 1 according to the presentembodiment can change the clamp voltage at the start of the clampoperation and after a predetermined time has passed since the start ofthe clamp operation. Accordingly, the semiconductor device 1 can operatethe first transistor Tr1 within the safe operation area during the clampoperation while keeping the breakdown voltage of the clamper CLrelatively high as described later.

Next, an operation of the semiconductor device 1 is explained in moredetail.

FIG. 4 is a timing chart showing an example of the operation of thesemiconductor device 1 according to the present embodiment. Thehorizontal axis represents the time. On the vertical axis, VIN indicatesa gate voltage applied to the gate of the first transistor Tr1 by thecontroller CNT. VDS indicates a voltage applied between the source andthe drain (hereinafter, also “source-drain voltage”) of the firsttransistor Tr1. IL indicates a current flowing in the load L and thefirst transistor Tr1.

First, before a time t0, the controller CNT sets the gate voltage VIN ata high-level voltage and thus the first transistor Tr1 is brought intoan on-state. Therefore, the first transistor Tr1 can cause a relativelylarge current IL to flow in the load L and the first transistor Tr1 witha low resistance.

Next, when the controller CNT lowers the gate voltage VIN to a low-levelvoltage at the time t0, the first transistor Tr1 attempts to become anoff-state. However, due to induced electromotive force generated by theload L, a large voltage VDS is applied to the drain of the firsttransistor Tr1. At this time, when the voltage VDS exceeds the breakdownvoltage of the clamper CL (the sum of the breakdown voltages of theZener diodes ZD1_1 to ZD2_2) as a predetermined voltage, the clamper CLcauses avalanche breakdown and increases the gate voltage of the firsttransistor Tr1. Accordingly, the first transistor Tr1 becomes anon-state and causes an induced current Ipeak to flow from the drain tothe source. As a result, breaking of the first transistor Tr1 due to theinduced electromotive force can be suppressed.

An operation of thus bringing the first transistor Tr1 into an on-stateby the clamper CL that is brought into a conduction state after thecontroller CNT brings the first transistor Tr1 into an off-state iscalled “clamp operation”. In the clamp operation, the clamper CL clampsthe voltage VDS to the predetermined voltage. For example, when therespective breakdown voltages of the Zener diodes ZD1_1 to ZD2_2 are VZ,the breakdown voltage of the clamper CL is 4×VZ. Therefore, when thevoltage VDS is about to exceed 4×VZ, the clamper CL clamps the voltageVDS to 4×VZ.

When the clamper CL starts the clamp operation, a current flows in thenodes N1 and N2. Accordingly, a voltage difference occurs between thenode N1 and the node N2. That is, a voltage difference occurs betweenthe both ends of the first resistive element R1 of the clamp operationdetector DT. This increases the output voltage of the differentialamplifier DIFF to approach the reference voltage Vref. When the outputvoltage of the differential amplifier DIFF exceeds the reference voltageVref at the time t0, the clamp operation detector DT outputs thedetection signal to the delay circuit DL and starts the operation of thedelay circuit DL from the time t0. The delay circuit DL applies apredetermined voltage (the high-level voltage VDD, for example) to thegate of the second transistor Tr2 after a delay time Tdelay (t0 to t1)has passed from the time t0. Therefore, the second transistor Tr2becomes an on-state at the time t1.

When the second transistor Tr2 becomes an on-state at the time t1, thenode N2 and the gate of the first transistor Tr1 are short-circuited.Accordingly, a state in which the second clamping part CL2 does notfunction effectively as a clamp circuit while the first clamping partCL1 is connected effectively between the drain of the first transistorTr1 and the gate thereof is obtained. As a result, the clamper CL clampsthe voltage VDS to 2×VZ in a period from the time t1 to a time t2. Thatis, while the clamp voltage is 4×VZ between the times t0 and t1, theclamp voltage is lowered to 2×VZ between the times t1 and t2.

When the current IL becomes sufficiently small after a clamp periodTclamp (t0 to t2) has passed, the source-drain voltage VDS of the firsttransistor Tr1 is sufficiently lowered and the clamper CL becomes anon-conduction state. This brings the first transistor Tr1 into anoff-state and the clamp operation ends.

A relation between the operation and the safe operation area of thefirst transistor Tr1 is explained next.

FIG. 5 is a graph showing a safe operation area of the first transistorTr1 according to the present embodiment. The horizontal axis representsthe source-drain voltage VDS of the first transistor Tr1. The verticalaxis represents a drain current ID of the first transistor Tr1. Therelation between the operation and the safe operation area of the firsttransistor Tr1 is explained with reference to FIG. 5. In this example,the drain current ID of the first transistor Tr1 is equal to the loadcurrent IL shown in FIG. 4.

Ranges Raso_1 and Raso_2 enclosed by lines L1 to L5 are the safeoperation areas of the first transistor Tr1. The safe operation areasRaso_1 and Raso_2 are ranges of the drain current ID and thesource-drain voltage VDS in which the first transistor Tr1 can operatewithout breaking down.

The range Raso_1 indicates a safe operation area immediately after thestart of the clamp operation and is an area enclosed by the x axis, they axis, the lines L1 and L2, the line L4_1 (a broken line), and the lineL5. The range Raso_2 indicates a safe operation area after apredetermined time has passed since the start of the clamp operation andis an area enclosed by the x axis, the y axis, and the lines L1, L2, L3,L4_2, and L5.

When the source-drain voltage VDS is 0 to V2, the upper limit of thedrain current ID in the safe operation areas Raso_1 and Raso_2 isdefined by the line L1. The line L1 indicates a current value defineddepending on an on-resistance of the first transistor Tr1. That is, whenthe source-drain voltage VDS is low, the safe operation area Raso isdefined depending on the on-resistance of the first transistor Tr1.

When the source-drain voltage VDS is V2 to V3, the upper limit of thedrain current ID in the safe operation areas Raso_1 and Raso_2 isdefined by the line L2. The line L2 indicates a current value defineddepending on a resistance property of a wire connected to the source orthe drain of the first transistor Tr1. If the drain current ID exceedsthe line L2, the wire melts and becomes a cause of a malfunction.

When the source-drain voltage VDS is V3 to V4_2, the upper limit of thedrain current ID in the safe operation area Raso_2 is defined by theline L3. The line L3 indicates a current value defined depending on atemperature of the semiconductor device 1 (the semiconductor chip)(hereinafter, also “chip temperature”). When the chip temperatureexceeds a predetermined temperature (150° C., for example), elements ofthe semiconductor device 1 may be damaged. Therefore, when thesource-drain voltage VDS is V3 to V4_2, the drain current ID is reducedto the line L3 or lower to set the chip temperature at a value lowerthan the predetermined value.

When the source-drain voltage VDS is V4_1 to Vbv or V4_2 to Vbv, theupper limit of the drain current ID in the safe operation areas Raso_1and Raso_2 is defined by the line L4_1 or L4_2. The lines L4_1 and L4_2indicate current values defined depending on a secondary breakdownvoltage of the first transistor Tr1. When the drain current ID exceedsthe current values indicated by the lines L4_1 and L4_2, the firsttransistor Tr1 has a high possibility of breakdown.

Vbv indicates a breakdown voltage of the first transistor Tr1. When thesource-drain voltage VDS exceeds the breakdown voltage Vbv, the firsttransistor Tr1 is expected to break down. Therefore, regardless of thedrain current ID, the source-drain voltage VDS is set at a value equalto or lower than the breakdown voltage Vbv.

While low at the initial time of the start of the clamp operation, thechip temperature increases after the start of the clamp operation as thetime proceeds. Increase in the chip temperature lowers the secondarybreakdown voltage of the first transistor Tr1. Accordingly, the safeoperation area is relatively wide immediately after the start of theclamp operation as shown by Raso_1 and is narrowed as the time proceedsas shown by Raso_2.

As described above, the safe operation area Raso_1 is gradually narrowedafter the start of the clamp operation as the time proceeds to approachthe safe operation area Raso_2. Therefore, to suppress breakdown of thefirst transistor Tr1 in the clamp operation, it is conceivable that thesource-drain voltage VDS is lowered after a predetermined time haspassed since the start of the clamp operation.

The semiconductor device 1 according to the present embodiment thuslowers the clamp voltage after a predetermined time has passed since thestart of the clamp operation. That is, the clamp voltage is kept high atthe start of the clamp operation. On the other hand, after thepredetermined time (the delay time Tdelay) has passed since the start ofthe clamp operation, the clamp voltage is lowered.

For example, when the respective breakdown voltages of the Zener diodesZD1_1 to ZD2_2 are VZ as described above, the clamp voltage at the timeof the start of the clamp operation is 4×VZ. That is, the breakdownvoltage of the clamper CL is the sum (4×VZ, for example) of thebreakdown voltages of both the first and second clampers CL1 and CL2. Atthis time, the safe operation area is the area Raso_1 and is relativelywide. Therefore, the first transistor Tr1 is within the range of thesafe operation area Raso_1 as indicated by a point P1 in FIG. 5.

The second transistor Tr2 becomes an on-state after the delay timeTdelay shown in FIG. 4 has passed since the start of the clampoperation. Accordingly, the clamp voltage lowers to the breakdownvoltage (2×VZ, for example) of the first clamping part CL1. At thistime, the safe operation area changes from the area Raso_1 to the areaRaso_2. As shown in FIG. 5, the clamp voltage lowers from 4×VZ to 2×VZand the drain current ID lowers from the current Ipeak to a currentIdelay. Accordingly, the first transistor Tr1 is within the safeoperation area Raso_2 as indicated by a point P2 in FIG. 5.

As described above, according to the present embodiment, the clampvoltage is the sum (4×VZ, for example) of the breakdown voltages of boththe first and second clampers CL1 and CL2 before the start of the clampoperation and before the predetermined time (t2 in FIG. 4) has passedsince the start of the clamp operation. The clamp voltage then lowers tothe breakdown voltage (2×VZ, for example) of the first clamping part CL1after a predetermined time (the delay time Tdelay) has passed. That is,the semiconductor device 1 according to the present embodiment canchange the clamp voltage in plural stages during the clamp operation.Accordingly, while the breakdown voltage of the clamper CL before thestart of the clamp operation is kept high, the first transistor Tr1 canbe operated within the safe operation area (Raso_1 and Raso_2) after thestart of the clamp operation.

Because the breakdown voltage of the clamper CL before the start of theclamp operation can be kept high, a voltage that can be applied when thefirst transistor Tr1 is in an off-state (a load dump surge voltage orthe power supply voltage VDD, for example) can be set high. On the otherhand, after the predetermined time has passed from the start of theclamp operation, the clamp voltage can be lowered to operate the firsttransistor Tr1 within the safe operation area.

The safe operation area varies according to the size (gate width/gatelength) of the first transistor Tr1, the type of the first transistorTr1, or the package thereof. Accordingly, the breakdown voltage VZ ofthe Zener diode in the clamper CL, the delay time Tdelay in the delaycircuit DL, and the like need to be set for each product.

When the size of the first transistor Tr1 is large, the safe operationarea is relatively wide. However, if the first transistor Tr1 isdownscaled, the secondary breakdown voltage is lowered. The safeoperation area is thus narrowed due to downscaling of the firsttransistor Tr1. If the clamp voltage is constant in the downscaled firsttransistor Tr1, the clamp voltage of the clamper CL needs to be set at alow value in advance assuming that the safe operation area is furthernarrowed with increase in the chip temperature after the start of theclamp operation. In this case, the breakdown voltage of the clamper CLbefore the start of the clamp operation cannot be kept high.

On the other hand, according to the present embodiment, the breakdownvoltage of the clamper CL before the start of the clamp operation can bekept high and also the clamp voltage can be lowered after thepredetermined time has passed from the start of the clamp operation,thereby operating the first transistor Tr1 within the safe operationarea.

Therefore, even when the first transistor Tr1 is downscaled, thesemiconductor device 1 according to the present embodiment can operatethe first transistor Tr1 within the safe operation area. That is, evenwhen the size of the first transistor Tr1 is reduced, the presentembodiment can change the breakdown voltage of the clamper CL during theclamp operation, thereby enabling the first transistor Tr1 to operatewithin the safe operation area while keeping the breakdown voltage ofthe clamper CL high.

In the embodiment described above, the clamper CL has the first andsecond clampers CL1 and CL2 and changes the clamp voltage in two stages.However, the clamper CL can change the clamp voltage in three or morestages. In this case, it suffices to provide a plurality of the delaycircuits, the second transistors, and the clamp operation detectors,respectively.

In the embodiment described above, the second transistor Tr2 isconnected between the node N2 and the gate of the first transistor Tr1.However, the second transistor Tr2 can be connected between the node N1and the gate of the first transistor Tr1.

Furthermore, in the embodiment described above, the second transistorTr2 is an N-transistor. However, the second transistor Tr2 can be aP-transistor. In this case, it suffices to configure the clamp operationdetector DT to output a low-level voltage to bring the second transistorTr2 into an on-state when the voltage difference between the nodes N1and N2 increases and the output voltage of the differential amplifierDIFF exceeds the reference voltage Vref.

While certain embodiments have been described, these embodiments havebeen presented by way of example only, and are not intended to limit thescope of the inventions. Indeed, the novel methods and systems describedherein may be embodied in a variety of other forms; furthermore, variousomissions, substitutions and changes in the form of the methods andsystems described herein may be made without departing from the spiritof the inventions. The accompanying claims and their equivalents areintended to cover such forms or modifications as would fall within thescope and spirit of the inventions.

1. A semiconductor device comprising: a first transistor capable ofsupplying or interrupting power to a load; a clamper comprising a firstclamping part and a second clamping part connected in series between oneend of the first transistor and a gate of the first transistor, theclamper becoming a conduction state when a voltage of the one end of thefirst transistor exceeds a predetermined voltage; a clamp operationdetector provided between the first clamping part and the secondclamping part; a second transistor connected in parallel with the secondclamping part; and a delay circuit provided between the clamp operationdetector and a gate of the second transistor.
 2. The device of claim 1,wherein the first and second clamping parts respectively comprise asingle Zener diode or a plurality of Zener diodes connected in series.3. The device of claim 2, wherein the single or plural Zener diodesincluded in the first and second clamping parts are connected betweenthe one end of the first transistor and the gate thereof in such amanner that a current direction from the gate to the one end is aforward direction.
 4. The device of claim 1, wherein the delay circuitis an RC delay circuit.
 5. The device of claim 2, wherein the delaycircuit is an RC delay circuit.
 6. The device of claim 3, wherein thedelay circuit is an RC delay circuit.
 7. The device of claim 1, whereinthe delay circuit is a counter counting a clock signal.
 8. The device ofclaim 2, wherein the delay circuit is a counter counting a clock signal.9. The device of claim 3, wherein the delay circuit is a countercounting a clock signal.
 10. The device of claim 1, wherein the delaycircuit applies a predetermined voltage to a gate of the secondtransistor after a predetermined time has passed from a time point whena detection signal indicating that the clamper becomes a conductionstate is received from the clamp operation detector, and the secondtransistor becomes an on-state upon reception of the predeterminedvoltage from the delay circuit.
 11. The device of claim 2, wherein thedelay circuit applies a predetermined voltage to a gate of the secondtransistor after a predetermined time has passed from a time point whena detection signal indicating that the clamper becomes a conductionstate is received from the clamp operation detector, and the secondtransistor becomes an on-state upon reception of the predeterminedvoltage from the delay circuit.
 12. The device of claim 3, wherein thedelay circuit applies a predetermined voltage to a gate of the secondtransistor after a predetermined time has passed from a time point whena detection signal indicating that the clamper becomes a conductionstate is received from the clamp operation detector, and the secondtransistor becomes an on-state upon reception of the predeterminedvoltage from the delay circuit.
 13. The device of claim 1, wherein theclamp operation detector comprises a first resistive element connectedbetween the first clamping part and the second clamping part, adifferential part converting a voltage difference between both ends ofthe first resistive element to a predetermined voltage and outputtingthe predetermined voltage, and a comparator outputting a detectionsignal to the delay circuit when an output voltage from the differentialpart exceeds a reference voltage.
 14. The device of claim 2, wherein theclamp operation detector comprises a first resistive element connectedbetween the first clamping part and the second clamping part, adifferential part converting a voltage difference between both ends ofthe first resistive element to a predetermined voltage and outputtingthe predetermined voltage, and a comparator outputting a detectionsignal to the delay circuit when an output voltage from the differentialpart exceeds a reference voltage.
 15. The device of claim 3, wherein theclamp operation detector comprises a first resistive element connectedbetween the first clamping part and the second clamping part, adifferential part converting a voltage difference between both ends ofthe first resistive element to a predetermined voltage and outputtingthe predetermined voltage, and a comparator outputting a detectionsignal to the delay circuit when an output voltage from the differentialpart exceeds a reference voltage.
 16. The device of claim 10, whereinthe clamp operation detector comprises a first resistive elementconnected between the first clamping part and the second clamping part,a differential part converting a voltage difference between both ends ofthe first resistive element to a predetermined voltage and outputtingthe predetermined voltage, and a comparator outputting a detectionsignal to the delay circuit when an output voltage from the differentialpart exceeds a reference voltage.
 17. The device of claim 1, wherein thesemiconductor device is a single semiconductor package.